TITLE A Simple Route for Preparation of Nanoporous Templates PRIMARY INVENTORS Tom Russell, Ph.D. DESCRIPTION Highly oriented and ordered arrays of cylindrical micro-domains could be achieved in thin films by using a combination of solvent casting and annealing.  By coupling this with the use of a preferential solvent for the minor component, arrays of nanopores in the thin films could easily be achieved with pore diameters down to 15 nm or less.  Upon a glancing angle evaporation of a metal onto the surface of the reconstructed film, an etching mask with very high etching contrast could be obtained that allowed the transfer of the pattern produced by the block copolymer into the underlying substrate with exceptional fidelity.  All of the processes described were non-disruptive and, as such, can easily be transferred to current micro-lithographic fabrication processes. This technique can be applied to addressable media such as magnetic storage. APPLICATIONS Nano-patterning of PS-b-P4VP using toluene and THF solvents at ambient environment can be used in the industrial process. It can be efficiently and economically achieved due to the ease of processing.  Of interest to companies in the areas of magnetic storage, electronics and optoelectronics. ADVANTAGES  Simple processing and easy control of pore size and separation distance. PATENT STATUS Patent pending LICENSING STATUS Available for Licensing and Research Collaboration DOCKET UMA 07-27 NOTES FOR MORE INFORMATION Office of Commercial Ventures and Intellectual Property phone: 413-545-3606 E-Mail: cvip@research.umass.edu