TITLE Index-tuned Anti-reflective Coating using a Nanostructured Metamaterial PRIMARY INVENTORS Ozgur Yavuzcetin, Mark Tuominen, Tom Russell http://www.umass.edu/massnanotech/ DESCRIPTION  An anti-reflective film is created by nanostructuring the surface of the optical material into which light transmission is desired. This is achieved by etching the surface through a nanoporous polymer film etch mask, thereby transferring the porous pattern to the optical material. The resulting nanostructured layer is considered an optical metamaterial (also known as an effective optical medium) -- a material with structural features much smaller than the wavelength of light, the presence of which changes the effective index of refraction.   The anti-reflection condition is satisfied by tuning the effective index of refraction by controlling the degree of porosity and the thickness of the porous layer. This method also results in an increase of the effective surface area of the top layer, enhancing results in a solar cell application. APPLICATIONS Solar cells and anti-reflective coatings ADVANTAGES Simple fabrication process that is amenable to large scale manufacturing Wider range of index of refraction as compared to typical deposited films Applicability to a wide variety of solar cell materials or other optical materials Better wear resistance than polymeric-based anti-reflectance coatings Lower top contact resistance Possibility for less pinhole defects than competing methods PATENT STATUS Patent pending LICENSING STATUS Available for Licensing or Research Collaboration DOCKET UMA 07-15 NOTES FOR MORE INFORMATION Ling X. Shen, Ph.D., M.B.A. Licensing Officer Phone: 413-545-5276 E-Mail: lxshen@research.umass.edu