TITLE Rapid 3D Patterning of Nanoparticle Materials Using Direct Incident Beam Lithography Download NCTD UMA 07-39 PRIMARY INVENTORS Yuval Ofir, Ph.D., Vincent M. Rotello, Ph.D., Mark T. Tuominen, Ph.D., Qijun Xiao, and Bappaditya Samanta DESCRIPTION This technology provides a simple, direct-write method to generate three-dimensional (3D) lithographic patterns of various nanoparticle materials such as metal, semiconductor, insulator and magnetic materials. In contrast to the standard electron beam lithography, which requires a multi-step process to pattern micro- or nano-structures on surfaces, this technology allows for a single-step patterning of a wide variety of nanoparticle films for the fabrication of 1-3D features in the nano-micro length scale. APPLICATIONS ·         Magnetics: Patterned media for hard disk drives; hard magnetic materials for motors and generators; route to good spring-exchange materials; patterned soft magnetic materials for RF/micro electronics. ·         Photonics/Plasmonics: NIR materials and applications; plasmonic waveguides, horns and devices; polarizers and filters. ·         3D structures for electronics and MEMs/NEMs: RF MEMS/NEMs such as inductors, switches, antennas, resonators, transmission lines, actuators, valves, Hall voltage sensors, tunneling magnetometers; RFID tags; electrodes and metal lines. ADVANTAGES ·         Simple and rapid patterning process: 3D features such as raised portions and bridges can be fabricated in a single "direct-write" step. ·         Multiple writing modes: Serial, parallel or a combination of serial and parallel writing modes can be used to fabricate desired 1-3D features. ·         Broad applicability: This technology can be used to pattern a wide variety of nanoparticle materials such as metal, metal oxides, metal alloys, semiconductor, insulator and magnetic materials with a wide choice of ligand systems such as thiols, phosphates, amines, pyridines, etc. ·       High flexibility and utility in nano/micro-fabrication: Various flat substrates or three-dimensional templates can be used in nano/micro-fabrication to generate complex 3D product structures via sequential structure formation. PATENT STATUS Patent Pending LICENSING STATUS Available for Licensing or Sponsored Research DOCKET UMA 07-39 NOTES FOR MORE INFORMATION Ling X. Shen, Ph.D., M.B.A. Licensing Officer Phone: 413-545-5276 E-Mail: lxshen@research.umass.edu